Angle-resolved photoemission microscopy

The beamline houses unique microscope designed for studies of the local band structure of the materials. VUV beam is focused into a sub-µm spot and electrons arising from the photoemission process are collected and analyzed in terms of their angular and energy distributions (ARPES). Thanks to the beam focusing the photoelectron spectrum is acquired as a function of its origin on a sample surface coordinate system. The final focusing is performed with one of the two Schwarzschild objectives designed for 27 and 74 eV of photon energy. The ARPES is performed with energy and angular resolutions down to 14 meV and 0.150 by means of internal movable electron energy analyzer mounted on precision two axes goniometer setup . The sample can be measured at 15-470 K and the sample focusing and imaging are performed thanks to the XYZR sampe scanning stage.
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