The aim of this SYLOS laser driven beam line is to provide XUV attosecond pulses in a train or isolated via high-order harmonic generation in low pressure noble gasses using an extremely loose focusing scheme. In addition to the various pump-probe schemes and diagnostic units, it offers huge space and enormous flexibility to all users with its numerous output ports available.

Laser-based light source parameters


Source type
Photon energy range / wavelength range
17 - 100 [eV]
Spectral Bandwidth FWHM / %
5000 - 10000 [meV]
Beam shape
Pulse duration FWHM
0.5 * 10-15 [s]
Linear Vertical
Pulse repetition rate
1 * 103 [Hz]
Maximum pulse energy
5 * 10-7 [J]
Peak power
1 * 1010 [W]
Support Laboratories

Chemical Preparatory Laboratory


General purpose chemistry laboratory, which supports the sample/target preparation of the users. It is equipped with the basic chemistry laboratory tools. These include (among others):

-       Glovebox with controlled O2 and H2O content

-       Fume hoods

-       Analytical balance

-       Plasma cleaner

-       Ultrasonic bath

-       Temperature controlled water bath

-       pH meter

-       Hotplate

-       High temperature furnace

-       Vacuum dryer with heating capacity

-       Microcentrifuge

-       General purpose glassware and plasticware (beakers, pipettes, vials)

In addition, a state-of-the-art electrochemical workstation is also available, which includes a potentiosat/galvanostat with fast sampling capabilities, equipped with electrochemical impedance spectroscopy module as well as IMPS/IMVS setup.

Electrical Workshop


Serious contribution to the Research Technology installations / commissioning, including each primary sources and beamlines, PSS, MPS, timing, DAQI and all the related facility systems. Highly equipped electrical workshop to allow members and users to access full spectrum of available solutions.

Some of the core capabilities/main instruments:

-Oscilloscope (from 350MHz 5GSa, till 4GHz, 20GSa, 4 channel)
-Special supplies for laboratory use
-Signal generator for delay/triggering/synchronising (9kHz-6GHz)
-EMI measuring kit (spectrum analiser 10Hz-7GHz, antennas, probes)
-PCB prototyper
-Optical cable welder kit
-General electrical measuring devices (multimeters, power analyser, etc.)
-Touch protection measuring kit
-Data logger device (20 channel)

Mechanical Workshop


Merge together traditional milling- and high-end CNC technology. Precision machining, welding, assembling, 3D coordinate measurements, CAM programming and rapid prototyping, just a few from the core capabilities.

-3D CNC milling machine, work area: 1300x700x700mm
-5D CNC milling machine, work area: 1000x560x550mm
-CNC lathe, 1000mm centre width
-General lathe 1000mm centre width, with glass scales
-General lathe 3000mm centre width, with glass scales
-2 pieces of general milling machine, work area: 930x430x600mm
-General milling machine, work area: 1200x550x600mm
-Surface grinding machine, work area: 600x1020mm
-2 pieces of column drilling machine
-Milling-drilling machine, work area: 500x250x540mm
-Metal band saw for sawing long rods
-Bench grinding machines
-Column drilling machine, work area: 400x640mm
-3D coordinate measuring machine, work area: 1000x700x600mm, accuracy: ±6µm
-CO welding machine
-AWI welding machine
-Mobile plasma cutter, max. thickness: 40mm
-Ultrasonic cleaners, 12L, 42L, 162L
-3D prototyping system Stratasys F170 3D printer for ABS, ASA and PLA materials up to 254mm^3 dimensions

Nano Science Laboratory


Our main device at the Nano Science Laboratory of ELI-ALPS is a RAITH eLINE Plus electron beam lithography system with ultrahigh resolution. The system comprises of a scanning electron microscope based imaging tool equipped with fast electrostatic beam-blanking and pattern generator allowing the electron beam exposure of different resists along predefined routes/lines/shapes. The beam energy is selectable between 20 eV and 30keV. During electron beam exposure the x-y positioning of the sample is ensured by a laser interferometer controlled stage on a 100 mm x 100 mm travel range with 1 nm positioning resolution, and the device is equipped with an automated height sensing unit. The size of the write fields can be adjusted from 0.5 micron to 2 mm, the minimal beam size at 20 kV accelerating voltage is 1.6 nm. The minimum periodicity of the gratings produced by the system does not exceed 40 nm, and the minimum feature size is smaller than 8 nm. For imaging, the system is equipped with an off-axis Everhart-Thornley secondary electron detector and an in lens, combined secondary and backscattered electron detector. Analyzing the chemical composition of the investigated samples is also possible with an X-ray spectrometer and energy dispersive microanalysis system (EDS), capable to detect elements with atomic number between 5-95. The system is equipped with a 3D Module having a motorized arrangement for rotating and tilting samples of size 10 mm x 10 mm with tilt angles between 0 - 90 degree and rotation angles between 0 - 360 degree.

The laboratory has the equipment necessary for resist preparation, i.e. a spin-coater, a plasma cleaner, a hot-plate and ultrasonic bath are available.

Optical Metrology Laboratory


As a member of the Optical Preparatory Workshops the Optical Metrology Lab is providing comprehensive optical measurement and characterization services. It works as the quality control laboratory for the incoming optics where all the specified parameters are investigated. Additionally the lab of course host the measurements for the in-house activities.

-Calipers (<=300mm; 0.01mm)
-Micrometers (<=100mm; 0.001mm)
-Indicators with granite stands (0.001mm)
-Protractor (1’)
-Visual inspection incl. microscopes
-Ionizing blow-off guns
-Laminar flow boxes (ISO3)
-Ultrasonic bath for cleaning

Spectrophotometer UV-Vis-NIR, PerkinElmer Lambda 1050 equipped with
-URA (Universal Reflectance Accessory) AOI=8÷65°
-DRA (Diffuse Reflectance Accessory), ø60mm and ø150mm integrating sphere
-GPOB (General Purpose of Optical Bench) for gratings and complex optical sub-systems

ZYGO laser interferometer for surface form measurements equipped with
λ/20@633nm reference plan/sphere for AR and HR coated optics respectively (no compromise with attenuators)

Spectrally resolved WL interferometer for spectral phase (GDD) measurements
-Vis-NIR spectral range (500-1400nm)
-Fits 0.5”-12” optics
-AOI=0÷50°; S- and P-pol respectively
-Accuracy ±10fs2

Spectroscopic Ellipsometer SEMILAB SE-2000 (rotating compensator)
-Phase and phase-shift characterisation
-UV-Vis-NIR range (193-1690nm)
-Complex indices investigation
-Anisotopic measurements
-Surface morphology and coating stack structures

Measuring equipment for Lenses and Optical systems
-+/- FL as well as BFL
-CX and CC radii

Application oriented in-house systems
-Sources (WL, stab. HeNe, photodiodes, supercontinuum)
-Detectors (spectrometers for Vis-NIR range)

Optical Polishing Workshop


As a member of the Optical Preparatory Workshops the Polishing workshop is dedicated to custom optical fabrication/finishing, including substrate refurbishing.

Every kind of geometrical attributes can be achieved in-house prepared from rough materials (glass, fused silica, crystals, metals and ceramics) within the dimensions dia. 10-200mm / radii 5-0mm. Optical, mechanical tolerances according to ISO standards.

5D CNC optical processing center (max. dia.250mm)
NC controlled Optic cutter
Laser interferometer (4" vertical) for surface form measurements
Traditional lever machine for precision polishing
Manual polishing machine for correction polishing    

Thin Film Coating Laboratory


As a member of the Optical Preparatory Workshops the Thin Film Coating Lab is intended to serve any kind of custom optical multilayer coating request. In our facility we have a HV coating system equipped with a variety of deposition sources e.g. 2* resistance (thermal) sources for proper metal films, a multi-pocket electron beam source for dielectrics, with a KRI end-Hall ion-source for adequate substrate cleaning as well as ion-assisted deposition. Apart from that we have 2 magnetrons that can be switched between both from RF/DC power supplies in order to allow us to do sequential sputtering of complex multilayer structures if needed. For better homogeneity we have flat (for sputtering), calotte (semi-spherical for evaporation) and planetary gear substrate holders, due to different source characteristics. We use OptiLayer thin film software(s) to characterize, design and reverse-engineer coatings. This all comes with the flexibility to iterate problems directly with the colleagues/users in-house.

Vacuum Laboratory (Cleanroom service included)


Vacuum technology and equipment assembly group is responsible to implementation related activities, especially vacuum, optics and optomechanics as well as cleanroom services. The group maintains a small complementary workshop that is dedicated to some milling capabilities allowing colleagues to modify mechanical parts in urgent cases; and has an off-line vacuum system for demonstration, training, measurement and calibration purposes. The group provide a variety of cleaning techniques based on the application that requires vacuum cleanliness. This of course comes with adequate metrology support.

-Column drilling machine
-D280x700mm centre width bench lathe
-Milling-drilling machine, work area: 280x175x280mm
-Part and ultrasonic cleaner

-RGA analysis, vacuum gauge calibration, specimen degassing rate measurement, etc

-dedicated and disposable cleanroom garments, cleanroom consumables and comprehensive maintenance service

Prof. Katalin Varjú
  • IR spectroscopy
  • Time-resolved studies
Emission or Reflection
  • Reflectrometry
Ion Spectroscopy
  • Mass spectrometry
  • EUV litography
Photoelectron emission
  • Time-resolved studies
control/Data analysis
Control Software Type
  • -
Data Output Type
  • -
Data Output Format
  • -
Equipment That Can Be Brought By The User