Light matter interactions have fundamental importance in today’s science to explore the behavior of material systems on nanometers scale. ELI-ALPS provides unique opportunity to explore new areas in chemistry not possible previously. The wavelength of light produced at ELI-ALPS is comparable to the size of natural (proteins, DNA etc.) and artificial molecular assemblies (semiconductor quantum dots, nanodiscs, nanorods, nanotubes, metal nanoparticles, graphene, layered quantum dots etc.) on nanometer scale, enabling us to investigate electronic behaviors of these systems. With the help of ELI-ALPS’s new exciting capabilities, the intensity of electromagnetic radiation at terahertz will be sufficient to exert perturbation on these nanosystems well-beyond the weak regime. The terahertz frequencies available at ELI-ALPS are below the natural resonance frequencies (electronic and vibrational) of common materials.
The beamline provides opportunity to investigate the intense terahertz process in the gas phase and in the condense phase. First, the beamline provides opportunity to study XUV photoinduced gas phase photodissociation processes in the presence of intense terahertz radiation. The terahertz radiation can produce an important control on the outcome of these simple chemical reactions such as molecular alignment and modulation of the dissociation pathways. These experiments can be realized in the reaction chamber where attosecond XUV pulses and terahertz pulses are combined. The chemiluminescence of the molecular fragments are recorded with the help of high resolution step scan Fourier Transform UV/Visible, IR spectrometer. Second, the beamline will allow to perform transient absorption measurements to study the impact of the intense terahertz in photo induced processes on condense phase molecular and photophysical processes.
General purpose chemistry laboratory, which supports the sample/target preparation of the users. It is equipped with the basic chemistry laboratory tools. These include (among others):
- Glovebox with controlled O2 and H2O content
- Fume hoods
- Analytical balance
- Plasma cleaner
- Ultrasonic bath
- Temperature controlled water bath
- pH meter
- High temperature furnace
- Vacuum dryer with heating capacity
- General purpose glassware and plasticware (beakers, pipettes, vials)
In addition, a state-of-the-art electrochemical workstation is also available, which includes a potentiosat/galvanostat with fast sampling capabilities, equipped with electrochemical impedance spectroscopy module as well as IMPS/IMVS setup.
Serious contribution to the Research Technology installations / commissioning, including each primary sources and beamlines, PSS, MPS, timing, DAQI and all the related facility systems. Highly equipped electrical workshop to allow members and users to access full spectrum of available solutions.
Some of the core capabilities/main instruments:
Merge together traditional milling- and high-end CNC technology. Precision machining, welding, assembling, 3D coordinate measurements, CAM programming and rapid prototyping, just a few from the core capabilities.
Our main device at the Nano Science Laboratory of ELI-ALPS is a RAITH eLINE Plus electron beam lithography system with ultrahigh resolution. The system comprises of a scanning electron microscope based imaging tool equipped with fast electrostatic beam-blanking and pattern generator allowing the electron beam exposure of different resists along predefined routes/lines/shapes. The beam energy is selectable between 20 eV and 30keV. During electron beam exposure the x-y positioning of the sample is ensured by a laser interferometer controlled stage on a 100 mm x 100 mm travel range with 1 nm positioning resolution, and the device is equipped with an automated height sensing unit. The size of the write fields can be adjusted from 0.5 micron to 2 mm, the minimal beam size at 20 kV accelerating voltage is 1.6 nm. The minimum periodicity of the gratings produced by the system does not exceed 40 nm, and the minimum feature size is smaller than 8 nm. For imaging, the system is equipped with an off-axis Everhart-Thornley secondary electron detector and an in lens, combined secondary and backscattered electron detector. Analyzing the chemical composition of the investigated samples is also possible with an X-ray spectrometer and energy dispersive microanalysis system (EDS), capable to detect elements with atomic number between 5-95. The system is equipped with a 3D Module having a motorized arrangement for rotating and tilting samples of size 10 mm x 10 mm with tilt angles between 0 - 90 degree and rotation angles between 0 - 360 degree.
The laboratory has the equipment necessary for resist preparation, i.e. a spin-coater, a plasma cleaner, a hot-plate and ultrasonic bath are available.
As a member of the Optical Preparatory Workshops the Optical Metrology Lab is providing comprehensive optical measurement and characterization services. It works as the quality control laboratory for the incoming optics where all the specified parameters are investigated. Additionally the lab of course host the measurements for the in-house activities.
Spectrophotometer UV-Vis-NIR, PerkinElmer Lambda 1050 equipped with
-URA (Universal Reflectance Accessory) AOI=8÷65°
-DRA (Diffuse Reflectance Accessory), ø60mm and ø150mm integrating sphere
-GPOB (General Purpose of Optical Bench) for gratings and complex optical sub-systems
ZYGO laser interferometer for surface form measurements equipped with
λ/20@633nm reference plan/sphere for AR and HR coated optics respectively (no compromise with attenuators)
Spectrally resolved WL interferometer for spectral phase (GDD) measurements
-Vis-NIR spectral range (500-1400nm)
-Fits 0.5”-12” optics
-AOI=0÷50°; S- and P-pol respectively
Spectroscopic Ellipsometer SEMILAB SE-2000 (rotating compensator)
-Phase and phase-shift characterisation
-UV-Vis-NIR range (193-1690nm)
-Complex indices investigation
-Surface morphology and coating stack structures
Measuring equipment for Lenses and Optical systems
-+/- FL as well as BFL
-CX and CC radii
Application oriented in-house systems
-Sources (WL, stab. HeNe, photodiodes, supercontinuum)
-Detectors (spectrometers for Vis-NIR range)
As a member of the Optical Preparatory Workshops the Polishing workshop is dedicated to custom optical fabrication/finishing, including substrate refurbishing.
Every kind of geometrical attributes can be achieved in-house prepared from rough materials (glass, fused silica, crystals, metals and ceramics) within the dimensions dia. 10-200mm / radii 5-0mm. Optical, mechanical tolerances according to ISO standards.
5D CNC optical processing center (max. dia.250mm)
NC controlled Optic cutter
Laser interferometer (4" vertical) for surface form measurements
Traditional lever machine for precision polishing
Manual polishing machine for correction polishing
As a member of the Optical Preparatory Workshops the Thin Film Coating Lab is intended to serve any kind of custom optical multilayer coating request. In our facility we have a HV coating system equipped with a variety of deposition sources e.g. 2* resistance (thermal) sources for proper metal films, a multi-pocket electron beam source for dielectrics, with a KRI end-Hall ion-source for adequate substrate cleaning as well as ion-assisted deposition. Apart from that we have 2 magnetrons that can be switched between both from RF/DC power supplies in order to allow us to do sequential sputtering of complex multilayer structures if needed. For better homogeneity we have flat (for sputtering), calotte (semi-spherical for evaporation) and planetary gear substrate holders, due to different source characteristics. We use OptiLayer thin film software(s) to characterize, design and reverse-engineer coatings. This all comes with the flexibility to iterate problems directly with the colleagues/users in-house.
Vacuum technology and equipment assembly group is responsible to implementation related activities, especially vacuum, optics and optomechanics as well as cleanroom services. The group maintains a small complementary workshop that is dedicated to some milling capabilities allowing colleagues to modify mechanical parts in urgent cases; and has an off-line vacuum system for demonstration, training, measurement and calibration purposes. The group provide a variety of cleaning techniques based on the application that requires vacuum cleanliness. This of course comes with adequate metrology support.
-RGA analysis, vacuum gauge calibration, specimen degassing rate measurement, etc
-dedicated and disposable cleanroom garments, cleanroom consumables and comprehensive maintenance service