The experimental area E4 at Extreme Light Infrastructure - Nuclear Physics(ELI-NP) will have two of the output laser beams of 100 TW with the ultrashort pulse (pulse duration FWHM: 25 fs) and the high repetition rate (10 Hz). The interaction chamber at E4 is designed for combining two wavelengths("colour") lasers and focus together in the same focus spot to generate some nonlinear effects under ultra-high vacuum. Those two colours lasers can be independently handled and focused on the target in the collinear configuration. The particularity of the interaction chamber is that it was designed for ultra-high vacuum (UHV) around 10^-10 mbar.
The Electronics laboratory offers several services associated to this specific field of activities such as the maintenance of equipment, repairs, technical support for preparing and performing experiments. The laboratory is equipped with machines that can be used for the measurements of electrical parameters in Physics and applied Electronics at ELI-NP. Therefore the design and development of prototypes (in small quantities), electronics’ modules, adaptors or simple automation devices can be done properly. These activities serve for the research, in general, as well as for supporting the experiments or the utilities present at ELI-NP. The measurements made in this laboratory can be of help when it comes to investigating potential malfunctions on devices that are to be used in experimental set-ups as well as the checkup of homemade system/device.
For the abovementioned activities, we can find the following corresponding devices in the laboratory:
The cutting edge technology available in the Optics Laboratory of the Extreme Light Infrastructure –Nuclear Physics Research Center makes the research facility the ideal place for laser pulse characterization, beam diagnostics, wavefront analysis, laser induced damage threshold, interferometry and so on. The lab itself is an ISO 6-ISO 7 cleanroom facility provided with all necessary cleanroom access equipment.
The research teams interested in using our facility or collaborating with our top notch scientists, are provided with multiple optical tables and optical boards, wide range of optics and opto-mechanic equipment, high end optical instruments, and all auxiliary electronic devices such as computers, oscilloscopes, power supplies, delay pulse generators, multimeters, etc.
More details and pictures are in the Document section of the General page.
Target Laboratory, currently extending over 270 m2 area of cleanroom-environment (ISO 6 and ISO 7), dedicated to the development, fabrication, characterization and micro-assembly of targets for experiments with high power lasers and gamma beams.
Accommodating a wide range of state-of-the-art equipment, and a specialized team of materials scientists and engineers, Target Laboratory is set up to address the demands for targets, provide support throughout the entire process: from proposal evaluation of the target to technical feasibility and up to target delivery; and to perform R&D activities in order to continuously develop and upgrade novel target designs.
In-house production of targets (within ELI-NP Target Laboratory) results in benefits such as avoiding the damage of the fragile targets (which occurs usually during transportation), meeting specific target requirements in terms of chemical stability and purity, ongoing optimization of target key-parameters, custom-made possibilities and last-moment modifications and adjustments of the targets, thorough characterization of targets just before the shot, but also, on the long run, and additional reduced manufacturing costs due to internally developed technologies and methodologies.
Among the capabilities and cutting-edge equipment available in the Target Laboratory are: two ultra-high vacuum deposition systems (RF/DC sputtering deposition and e-beam evaporation, for thick/thin/ultra-thin (ultra)pure metallic/nitrides/oxides films fabrication), equipped with an Ar-ion milling unit (for cleaning the wafers prior to deposition) and Nanogen unit (for nanoparticles deposition); optical lithography tools (mask aligner, spin coater, hot plates); reactive ion etching tool and electron beam lithography system (for structuring/patterning the targets), tubular furnace, calcination furnace and vacuum drying oven (for surface conditioning and sample processing) along with a specialized chemistry room. For characterization analysis, the following equipment are available: scanning electron microscope (SEM) with microanalysis by energy dispersive X-ray spectroscopy (EDS) and electron backscatter diffraction (EBDS), X-ray diffractometer (XRD), atomic force microscope (AFM), optical profilometer (confocal, interferometry) and several optical microscopes. The “Micro-assembly” room, dedicated to microfabrication and assembly of complex targets, includes: universal machines for precision mechanics and micromechanics processing (lathe and milling), accompanied by a set of related accessories required for processing operations (orientation fixtures and parts, devices, tool holders etc.)
A more detailed presentation of the laboratory can be found in the Document section of the General page.